Fluoride ions at the Cu–fluoropolymer interface

作者: A. Naujokas , D. G. Abreu , G. A. Takacs , T. Debies , M. Mehan

DOI: 10.1002/SIA.5225

关键词:

摘要: Nanometer thick films of sputtered and evaporated Cu were deposited on the surfaces fluoropolymers poly(tetrafluoroethylene) (PTFE), poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) poly(tetrafluoroethylene-co-perfluoropropyl vinyl ether) (PFA) studied by both angle-resolved XPS at takeoff angles 10°, 45° 80° in situ argon ion etching. Higher yields fluoride to fluoropolymer ratio detected for than Cu. PFA FEP show enhanced interaction with produce ions relative more polycrystalline PTFE. At intermediate depths (takeoff angle 45°), exhibit strongest F 1s signals compared peaks. The amount reaches a maximum after brief Ar etching then decreases prolonged Compared untreated fluoropolymers, improved adhesion was observed that etched expose ions. Copyright © 2013 John Wiley & Sons, Ltd.

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