Growth and properties of nanostructured titanium dioxide deposited by supersonic plasma jet deposition

摘要: Abstract Titanium dioxide (TiO 2 ) is a wide gap semiconductor suitable for many applications. In this work, TiO nanostructured thin films are deposited by plasma assisted supersonic deposition technique on silicon and conductive glass substrates. Optical Emission Spectroscopy (OES) used to monitor conditions precursor dissociation reactions. The influence of parameters structure, uniformity, grain size, optical properties investigated atomic force microscopy (AFM), mechanical profilometer, scanning electron (SEM) spectroscopic ellipsometry (SE). Experimental results show how employed allows obtaining uniform films, with tunable range. Grains size could be chosen varying flux during the process. Films nanostructure porosity result affected grains size. Substrate roughness affect film morphology.