作者: C. Q. Jiao , C. A. DeJoseph , P. D. Haaland , A. Garscadden
DOI: 10.1007/978-1-4615-0583-9_17
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摘要: Nitrogen trifluoride is used extensively in several aspects of semiconductor processing and manufacture was also employed as an atomic fluorine source pulsed electrical-chemical lasers. The electron collision database interest for modeling simulation plasma enhanced etching materials. We have recently made comprehensive measurements the absolute dissociative ionization cross-sections nitrogen its charge transfer from argon ions. These results are reviewed compared with previous data literature. compile, where available, attachment, momentum transfer, vibrational excitation, excitation. This set swarm experiments mixtures NF3-argon NF3-nitrogen. needs opportunities additional experimental studies outlined.