Protection of boron nitride nanosheets by atomic layer deposition toward thermal energy management applications

作者: Wei Luo , Lihui Zhou , Zhi Yang , Jiaqi Dai , Emily Hitz

DOI: 10.1016/J.NANOEN.2017.08.004

关键词:

摘要: Abstract Hexagonal boron nitride (h-BN), a material with long-known excellent thermal and chemical stability, has emerged as one of the most attractive two-dimensional materials for energy management applications. However, recent discoveries revealed that oxidation h-BN occurs at relatively low temperature due to existence defects on flakes. Herein, we propose route protect from temperatures up 1000 °C by thin layer Al2O3 via atomic deposition (ALD). The ALD-Al2O3 terminates BN maintains intact under ambient atmosphere. In addition, thermally conductive electrically insulating glass been demonstrated through facile solution-processed nanosheets spray coating subsequent ALD. effectively glued increased adhesion between glass, which enabled high conductivity 4.55 W/m K while bare shows 0.94 W/m K. Furthermore, coating, more uniform distribution was obtained glass. We believe approach using ALD technology is potentially competitive scaling in or

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