Insight into the impact of nanovoids on the electrical and mechanical properties of nanotwinned copper films
作者： ZY Hu , JL Du , PP Wang , XJ Wang , Y Zhang
DOI: 10.1016/J.SCRIPTAMAT.2017.04.025
关键词:
摘要: Abstract This article reports the impact of nanovoids on macro-properties and its underlying physical mechanism in nanotwinned Cu films with synthesized via magnetron sputtering. The results indicate resistivity due to is proportional void porosity at 4 K film hardness induced by density slip plane while independent sizes. ratio thus able be improved tuning based above findings. These findings will definitely provide references for future study improvement materials' properties sputtering deposition techniques.
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