Electrochemistry in ultrahigh vacuum: underpotential deposition of Al on polycrystalline W and Au from room temperature AlCl(3)/1-ethyl-3-methylimidazolium chloride melts.

作者: Matthew Johnston , Jae-Joon Lee , Gary S. Chottiner , Barry Miller , Tetsuya Tsuda

DOI: 10.1021/JP051243M

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摘要: The voltammetric characteristics of polycrystalline Au and W electrodes cleaned (thermal annealing at 1100 K) characterized (Auger electron spectroscopy) in ultrahigh vacuum (UHV) have been examined ultrapure AlCl 3 /1-ethyl-3-methylimidazolium chloride (EtMeImCl) melts UHV. These experiments were performed using a custom-designed transfer system that allows for the all-Al electrochemical cell to be filled with EtMeImCl an auxiliary UHV chamber later transferred under main houses Auger spectrometer. results obtained underpotential (UPD) bulk deposition Al on found very similar those reported literature measurements carried out 1 atm inert gas glovebox. For far more reactive surfaces, features ascribed stripping underpotential-deposited could observed following single scan from 1.0 V vs + /Al potential negative enough ensue. This behavior is unlike glovebox, which required either extensive cycling region or excursions potentials positive chlorine evolution ensue UPD clearly discerned. observations open new prospects fundamental studies well-characterized, highly metals, including crystals, variety low vapor pressure ionic liquids.

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