Intense lasing in discharge excited noble-gas monochlorides
作者： Robert C. Sze , Peter B. Scott
DOI: 10.1063/1.90407
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摘要: Intense lasing of XeCl (180 mJ) and KrCl (100 occurs using HCl as the halogen doner. The low energies obtained from e‐beam devices are believed to result Ar+2 molecular‐ion absorption. Very long lifetime with respect gas fill is observed; this postulated be photodissociation Cl2 due laser wavelength which, in turn, results enhanced rates for formation HCl.
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