Mass‐separated negative‐ion‐beam deposition system
作者： Junzo Ishikawa , Yasuhiko Takeiri , Toshinori Takagi
DOI: 10.1063/1.1138577
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摘要: We developed a mass‐separated negative‐ion‐beam deposition system to investigate the interactions between low‐energy negative ions and solid surfaces evaluated its usefulness as an advanced technique for film formation. The consists of intense negative‐ion source deceleration electrode system. In new type sputter source, 0.74 mA C− ion beam was produced in high vacuum. has structure suppress divergent effect beam, where lens gap are closely placed. This is also simpler than any positive‐ion‐beam systems because production oppositely charged particles, i.e., positive that might be accelerated field, can neglected. A decelerated current several tens μA range final energy 10–100 eV about 100 over were ob...
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