Quantitative investigations of atomic processes on metal surfaces at atomic resolution

作者: T.T. Tsong

DOI: 10.1016/0079-6816(80)90001-5

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摘要: Abstract Using the atomic resolution of field-ion microscope (FIM) and single-atom identification capability time-of-flight atom-probe microscope, fundamental properties solid surfaces can be investigated at level. Atomic structures many surface planes are fully resolved. The chemical composition a determined with single layer spatial resolution. Several interactions atoms, which basic to understanding phenomena, such as atom substrate interaction, adatom-adatom adatom-impurity adatom-plane edge etc. all studied in details. charge distribution atom, manifest its dipole moment polarizability, also studied. Great advantages FIM investigations include availability atomically perfect planes, prepared by field evaporation process, direct observation images. Although some electronegative atoms cannot imaged, conditions state characterized atom-probe. Basic principles results these studies presented discussed.

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