作者: Wen-Jen Liu , Shih-Jeh Wu , Chih-Min Chen , Yin-Chieh Lai , Chun-Han Chuang
DOI: 10.1016/J.JCRYSGRO.2004.11.421
关键词:
摘要: Highly (002) c-axis-oriented AlN films have been successfully deposited on Ti/Si substrates using reactive magnetron radio frequency (RF) sputtering deposition and ideal AlN films …