Chemically deposited nanocrystalline NiO thin films for supercapacitor application

作者: UM Patil , RR Salunkhe , KV Gurav , CD Lokhande , None

DOI: 10.1016/J.APSUSC.2008.07.192

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摘要: Abstract A chemical synthesis process for the fabrication of NiO is described. In present work, we report a route preparation nickel hydroxide thin films on glass substrate from solution containing Ni (2+) ions and ammonia. The deposition based thermal decomposition ammonia complex with at temperature 333 K. As-prepared were annealed 623 K in air 2 h to remove phase used structural, surface morphological optical characterizations. It was found that after annealing β-phase Ni(OH) 2 transformed cubic structured NiO. Honeycomb like morphology “β-Ni(OH) ” merged resulted decrease porosity annealing. red shift band gap energy observed capacitive characteristics deposited steel investigated KOH electrolyte using cyclic voltammetry. supercapacitive properties strongly affected by scan rate, concentration mass material. maximum specific capacitance 167 F g −1 obtained 2 M electrolyte.

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