作者: Toshirou Kisakibaru , Makoto Okada , Naoji Iida , Yasushi Honda
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摘要: An apparatus for charging dry air or nitrogen gas into a container storing semiconductor wafers can remove chemical and moisture from the container, then prevent acid being generated at surfaces of wafers. The A 1 9 is connected to an opening 8 a, acting as intake, b, exhaust, wherein comprises plurality openings disposed bottom plate 1, comprising: PTFE filters 7 portion 11 providing 12 exhausting used after removing preventing 9.