Method and apparatus for film-thickness measurements

摘要: The invention describes a method for measuring property of sample by: 1) irradiating portion the with an excitation pattern characterized by at least one spatial phase and period; 2) diffracting probe beam off surface sample; 3) detecting diffracted optical detector to generate light-induced signal; 4) adjusting pattern; 5) repeating irradiating, steps additional 6) processing signals determine sample.