Rapid energy transfer annealing device and process

摘要: Disclosed is a rapid energy transfer annealing (RETA) device and process, where an plate used to rapidly absorb the primary photonic of light source, such as tungsten halogen lamp (or xenon Arc lamp), allow temperature elevation. The faces amorphous thin film deposited above glass or plastic substrate releases heat transferred by gas solid medium film,, so for transforming into polycrystalline film. On another side may be further provided with sink supporting plate. absorbs substrate, protects from damages due overheating. moved freely adjust distance between that plate, control released transfer. adjustment fixed varied function time randomly Further, conducting layer shielding layer. absorption selective crystallization, direction thereby guiding crystallization grow in specific direction.