Effects of bias voltage and gas pressure on orientation and microstructure of iridium coating by double glow plasma
作者： Wangping Wu , Zhaofeng Chen , Xin Lin , Binbin Li , Xiangna Cong
DOI: 10.1016/J.VACUUM.2011.09.003
关键词:
摘要: Abstract Iridium coating was produced on various substrates using a double glow plasma. The effects of bias voltage and gas pressure orientation microstructure the were studied. orientation, composition evaluated by X-ray diffraction, scanning electron microscopy energy dispersive spectroscopy. results showed that iridium coatings all exhibited preferred (220) under same deposition conditions. affected voltage, substrate effects. voltages had significant impact crystal coating. increase resulted in high temperature large rate. An thickness can affect
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