Theoretical Model for Radiation Enhanced Diffusion and Redistribution of Impurities. Comparison with Experiments

作者: S. Loualiche , C. Lucas , P. Baruch , J. P. Gailliard , J. C. Pfister

DOI: 10.1002/PSSA.2210690229

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摘要: The redistribution of boron in silicon through high temperature proton irradiation is described. It interpreted with a two-species model, where the impurity can exist either as slow or fast diffuser, transformation between these two species being induced interaction radiation defects. could be substitutional and interstitial boron. influence experimental parameters, especially concentration, beam current, studied by taking into account formation impurity—defect complexes direct vacancy—interstitial recombination. following thermodynamical parameters are proposed for boron: Em = 1.2 eV, Sm 0.14 k, D0 4 × 10−3 cm2/s. self interstitial—vacancy boron—interstitial capture radius would then 1.4a 4a respectively. Le phenomene de du bore dans le silicium par haute des protons est decrit. Il interprete un modele lequel l'impurete peut se presenter sous deux formes, avec coefficients diffusion differents, et qui transforment l'une en l'autre les defauts d'irradiation. Ces formes pourraient e'tre substitutionnel interstitiel. L'influence parametres experimentaux, particulier concentration d'impuretes, flux d'irradiation, etudiee, interpretee, prenant compte la impuretes—defauts, recombinaison directe lacune—impurete. On propose, pour interstitiel, thermodynamiques suivants: 1,2 0,14 cm2/s, rayons lacune—auto interstitie let lacune—bore interstitiel respectivement 1,4a 4a.

参考文章(20)
Ryukichi Hashiguchi, Lattice defects in semiconductors Univ. of Tokyo Press , Pennsylvania State Univ. Press. ,(1968)
Robert A. Johnson, Nghi Q. Lam, Solute segregation in metals under irradiation Physical Review B. ,vol. 13, pp. 4364- 4375 ,(1976) , 10.1103/PHYSREVB.13.4364
Pierre Baruch, Joel Monnier, Bruno Blanchard, Claude Castaing, Redistribution of boron in silicon after high−temperature proton irradiation Applied Physics Letters. ,vol. 26, pp. 77- 80 ,(1975) , 10.1063/1.88077
W. K. Chu, R. H. Kastl, R. F. Lever, S. Mader, B. J. Masters, Distribution of irradiation damage in silicon bombarded with hydrogen Physical Review B. ,vol. 16, pp. 3851- 3859 ,(1977) , 10.1103/PHYSREVB.16.3851
T. R. Waite, Theoretical Treatment of the Kinetics of Diffusion-Limited Reactions Physical Review. ,vol. 107, pp. 463- 470 ,(1957) , 10.1103/PHYSREV.107.463
Yasumitsu Morikawa, Keiichi Yamamoto, Koichi Nagami, Uphill diffusion mechanism in proton-irradiated silicon Applied Physics Letters. ,vol. 36, pp. 997- 999 ,(1980) , 10.1063/1.91667
J. R. Anderson, J. F. Gibbons, New model for boron diffusion in silicon Applied Physics Letters. ,vol. 28, pp. 184- 186 ,(1976) , 10.1063/1.88717
Pierre Baruch, Effets des rayonnements sur les semiconducteurs Journal De Physique. ,vol. 24, pp. 458- 464 ,(1963) , 10.1051/JPHYS:01963002407045800
A. Seeger, K. P. Chik, Diffusion Mechanisms and Point Defects in Silicon and Germanium Physica Status Solidi (b). ,vol. 29, pp. 455- 542 ,(1968) , 10.1002/PSSB.19680290202