Field effect transistor having contact layer of transistor gate electrode material

作者: Luigi Ternullo , Werner Alois Rausch , Randy William Mann , Subhash Balakrishna Kulkarni , Eric Adler

DOI:

关键词:

摘要: Improved field effect transistor (FET) structures are described. They include a thin film (TFT), wherein contact layer directly connects diffusion region of the TFT to an active site another device, e.g., transistor. This invention is especially suitable for TFT's which built on one or more conductive studs. Static random access memory (SRAM) cells incorporating also Moreover, this directed methods preventing alleviating problems associated with gouging during formation layers.

参考文章(6)
Charles H. Dennison, Monte Manning, Thin film transistor (TFT) loads formed in recessed plugs ,(1993)
Cecilia C. Smolinski, Wilbur D. Pricer, Bernard S. Meyerson, Thomas B. Faure, Three dimensional integrated device and circuit structures ,(1993)
Kiyofumi Ochii, Katsuhiko Sato, Masataka Matsui, Static semiconductor memory using thin film FET ,(1991)
Alexander Kalnitsky, Contact structure for integrated circuits ,(1993)
Hu H. Chao, Hsiang-Ming J. Chou, Fabrication of transistor contacts ,(1992)