Optical diffraction device and exposure apparatus
作者： Yasuyuki Unno
DOI:
关键词:
摘要: A binary-type optical diffraction device having the excellent capability of antireflection includes a step structure by which lens elements Fresnel are approximated. The surface steps formed on substrate is entirely covered with thin film flat surface. height each and refractive index selected so that conditions for respective satisfied thus intensity reflected light rays minimized.
google.de 参考文章(25)
Walter Huber, Andreas Franz, Phase grating having an unprotected relief structure with a grating structure that causes destructive interference of reflections ,(1996)
Paul Klocek, Patrick A. Trotta, Durable polymeric optical systems ,(1994)
J. Allen Cox, Scott A. Nelson, Gordon V. Jorgenson, Hybrid diffractive optical filter ,(1990)
Kazuo Ushida, Sumio Hashimoto, Projection optical system and projection exposure apparatus using the same ,(1995)
Brian R. Stallard, Sumanth Kaushik, Optical filter including a sub-wavelength periodic structure and method of making ,(1996)
G. J. Swanson, Binary Optics Technology: The Theory and Design of Multi-Level Diffractive Optical Elements Unknown. ,(1989) , 10.21236/ADA213404
Robert B. Chipper, Refractive/diffractive infrared imager and optics ,(1998)
Gary J. Swanson, Binary Optics Technology: Theoretical Limits on the Diffraction Efficiency of Multilevel Diffractive Optical Elements Unknown. ,(1991)
Kah Kuen Low, Prahalad K. Vasudev, Phase shifting mask structure with multilayer optical coating for improved transmission ,(1994)