Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag.
作者： Merijntje S. Bronsgeest , Nedjma Bendiab , Shashank Mathur , Amina Kimouche , Harley T. Johnson
DOI: 10.1021/ACS.NANOLETT.5B01246
关键词:
摘要: We measure uniaxial strain fields in the vicinity of edges and wrinkles graphene prepared by chemical vapor deposition (CVD), combining microscopy techniques local vibrational characterization. These have magnitudes several tenths a percent extend across micrometer distances. The nonlinear shear-lag model remarkably captures these terms graphene–substrate interaction provides complete understanding strain-relieving for any level coherency.
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