Electron source, electron gun, and electron microscope device and electron beam lithography device using it

摘要: An electron source is implemented which has a lower work function of an emission surface, yields emitted electrons narrower energy bandwidth and higher current density, lasts longer than existing Zr/O/W sources. Further, microscope image higher-resolution in shorter time beam lithography device throughput are also provided. The comprises needle-shaped electrode made metal having its tip needle shape, heating body heats up the electrode, diffusion capable being heated by mixture barium composite containing oxygen carbon particles.