Orientation dependence of the threshold displacement energy in copper and vanadium

摘要: Abstract The threshold displacement energy E d, has been determined by high-voltage electron microscopy for copper and vanadium as a function of orientation with the following results: copper, d⟨100⟩=27 eV, d⟨110⟩=18 d⟨111⟩=29 eV vanadium, d⟨100⟩=30eV, d⟨110⟩=39eV, d⟨111⟩=34eV. minimum directions are consistent observation other experimenters, ⟨110⟩ in f.c.c. ⟨100⟩ b.c.c. Significant sub-threshold displacements were observed copper. This is interpreted terms series collision involving interstitial hydrogen an intermediate particle. A good correlation found to exist between sublimation (E s) wide variety metals, original suggestion Seitz (1949). It shown that d approximately 4E s average 5E s.