Comparison between continuous and microwave oxygen plasma post-treatment on organosilicon plasma deposited layers: Effects on structure and properties

摘要: Abstract The aim of this work is to characterize and understand the effects oxygen plasma post-treatments on polymerized hexamethyldisiloxane (ppHMDSO) layers, as these layers are an alternative way produce SiO x (  ≈ 2) films. Oxygen discharges ppHMDSO films in continuous (DC) microwave multipolar excited by distributed electron cyclotron resonance (MW) compared studying their effect s post-treated layer thickness, chemical composition, film structure functional properties. Fourier Transform Infra-Red X-ray Photoelectron Spectroscopies have been used determine composition initial layers. post-treatment etches end bonds leads a cross-linking polymer chains (formation SiOC bonds). Oxidation process strongly linked type. A pre-existing model for oxide growth has applied, showing that MW more effective than DC. main conclusion resulting different each diffusion coefficient structure. Higher achieved films, which less dense obtained using DC technique. It also shown properties (such wettability, hardness electrical optical properties) modified after post-treatment. Finally, we briefly discuss most appropriate obtain according final application coatings.