Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates Identification.

作者: Yen Dao , Hai Tran , Thien Tran-Lam , Trung Pham , Giang Le

DOI: 10.3390/IJERPH15122637

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摘要: The combination of a low-pressure mercury lamp and chlorine (UV/chlorine) was applied as an emerging advanced oxidation process (AOP), to examine paracetamol (PRC) degradation under different operational conditions. results indicated that the UV/chlorine exhibited much faster PRC removal than UV/H₂O₂ or chlorination alone because great contribution highly reactive species (•OH, •Cl, ClO•). rate constant (kobs) accurately determined by pseudo-first-order kinetics. kobs values were strongly affected conditions, such dosage, solution pH, UV intensity, coexisting natural organic matter. Response surface methodology used for optimization four independent variables (NaOCl, UV, DOM). A mathematical model established predict optimize conditions in process. main transformation products (twenty compound structures) detected liquid chromatography coupled high-resolution mass spectrometry (LC-HRMS).

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