Method for manufacturing solid state imaging apparatus, and the solid state imaging apparatus
作者： Hajime Otake , 一 大武
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摘要: PROBLEM TO BE SOLVED: To provide a method for manufacturing solid state imaging apparatus capable of suppressing color mixing. SOLUTION: The the image forming device includes transparent resin layer 20 on semiconductor substrate 11 having plurality photodiode layers 12 formed thereon in lattice form, through R, G, and B filters that are according to Bayer arrangement; first microlens mother dies 23 at positions corresponding green G such manner outer peripheries thereof separated from each other. Further, includes: second 24 they fill gap between other; etching with being used as masks, thereby microlenses 18-1 18-2. COPYRIGHT: (C)2011,JPO&INPIT
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