Web lift system for chemical mechanical planarization
作者： John M. White , Phillip R. Sommer , Sasson Somekh
DOI:
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摘要: Generally, a method and system for lifting web of polishing material is provided. In one embodiment, the includes platen that has first lift member disposed adjacent to side second side. The adapted support media between members. A supporting on moving at least or an extended position relative places in spaced-apart relation with platen.
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