Laser irradiation apparatus and laser irradiation method
作者： Koichiro Tanaka , Shunpei Yamazaki , Naoto Kusumoto
DOI:
关键词:
摘要: It is an object of the present invention to provide a laser irradiation apparatus which can manufacture homogenously crystallized film by varying energy intensity beam in forward and backward directions irradiation. A comprises oscillator means for wherein obliquely incident into surface, scanned relative varied accordance with scanning direction. Further, continuous wave solid-state laser, gas or metal laser. pulsed having repetition frequency 10 MHz more also be used.
lens.org 参考文章(147)
Oishi Hiromasa, Yamazaki Shunpei, Tanaka Koichiro, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, LASER IRRADIATION METHOD, AND LASER IRRADIATION DEVICE ,(2004)
Abe Hiroyuki, MANUFACTURE OF SEMICONDUCTOR FILM AND THIN-FILM TRANSISTOR, AND ACTIVE MATRIX SUBSTRATE ,(2000)
Shinagawa Tatsuo, METHOD AND MOLD FOR MOLDING SPECTACLE FRAME ,(1985)
Kusumoto Naoto, Tanaka Koichiro, LASER ANNEALING AND IRRADIATION WITH LASER BEAM ,(1996)
Koichiro Tanaka, Yoshiaki Yamamoto, Laser irradiation method, laser irradiation apparatus, and method for fabricating semiconductor device ,(2005)
Mikio Hongo, Akio Yazaki, Mutsuko Hatano, Toshihiko Nakada, Osamu Okura, 大倉 理, 波多野 睦子, 中田 俊彦, 本郷 幹雄, 矢崎 秋夫, Laser annealing device and method of laser-annealing tft substrate ,(2002)
Hino Takeshi, Irinoda Mitsugi, MANUFACTURE OF THIN FILM SEMICONDUCTOR DEVICE ,(1993)
Norihito Kawaguchi, Koichiro Tanaka, Kenichiro Nishida, Laser irradiating apparatus ,(2002)
Mikio Hongo, Sachio Uto, Mineo Nomoto, Toshihiko Nakata, Mutsuko Hatano, Shinya Yamaguchi, Makoto Ohkura, None, Method of manufacturing display device ,(2008)
Mitsuhashi Hiroshi, Awano Takashi, Mizouchi Kiyotsugu, Laser irradiation method ,(2004)