Mechanical behavior related to various bonding states in amorphous Si–C–N hard films
作者： Chunqiang Zhuang , Christoph Schlemper , Regina Fuchs , Lei Zhang , Nan Huang
DOI: 10.1016/J.SURFCOAT.2014.09.002
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摘要: Abstract A series of amorphous Si–C–N hard films were prepared by an electron cyclotron resonance chemical vapor deposition method. Microstructure characterization revealed that contained various bonding states. Among them, Si N and C bonds played a leading role in determining the microstructure films. Mechanical measurements showed hardness these varied between 17 GPa 28 GPa as function tetramethylsilane flow rate. close relation states was found. The variation dominated bond fraction corresponded to Macroscopic mechanical properties material illustrated from perspective microscopic structural characterization.
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