作者: Ji-Myon Lee , Kyoung-Kook Kim , Seong-Ju Park , Won-Kook Choi
DOI: 10.1063/1.1379061
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摘要: Low-resistance and nonalloyed ohmic contacts to epitaxially grown n-ZnO were formed by exposing an inductively coupled hydrogen argon plasma. Using Ti/Au, the specific contact resistivity of was drastically decreased from 7.3×10−3 4.3×10−5 Ω cm2 plasma treatment. The photoluminescence spectrum treated ZnO showed a large enhancement in band-edge emission strong suppression deep-level emission. These results suggest that low can be attributed increase carrier concentration on surface. Ar-plasma sample also 5.0×10−4 Ω cm2, presumably due formation shallow donor surface ion bombardment.