作者: P. Ayyub , R. Chandra , P. Taneja , A.K. Sharma , R. Pinto
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摘要: Physical vapor deposition techniques such as sputtering and laser ablation – which are very commonly used in thin film technology appear to hold much promise for the synthesis of nanocrystalline films well loosely aggregated nanoparticles. We present a systematic study process parameters that facilitate growth metals oxides. The systems studied include TiO2, ZnO, γ-Al2O3, Cu2O, Ag Cu. mean particle size crystallographic orientation influenced mainly by power, substrate temperature nature, pressure flow rate gas. In general, were formed at or close 300 K, while adhering nanoparticles deposited lower temperatures.