作者: Qinghuang Lin , Minhua Lu , Robert L. Wisnieff
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摘要: A method for fabricating a thin film transistor includes printing source, drain and channel regions on passivated transparent substrate, forming gate dielectric over the region conductor dielectric. permanent antireflective coating is deposited source region, electrode, an interlevel layer formed coating. Openings in are to provide contact holes electrode. electrically connect Thin devices other methods also disclosed.