作者: Graciela B. Blanchet
DOI: 10.1063/1.108939
关键词:
摘要: Thin films of the amorphous fluoropolymer, Teflon AF(r), were deposited by laser ablation using 4th harmonic, at 266 nm, a Nd‐YAG laser. Infrared spectroscopy indicated that composition ablated starting materials and x‐ray diffraction spectra corroborated lack crystallinity. The morphology was controlled temperature substrate during film formation. We suggest pyrolitic decomposition subsequent repolymerization as possible mechanism to formation Teflon‐AF(r) ablation.