Semiconductor substrate processing system
作者： Satheesh Kuppurao , Errol Antonio C. Sanchez , David K. Carlson
DOI:
关键词:
摘要: Apparatus for processing substrates are provided. In some embodiments, a system may include first transfer chamber and process coupled to the chamber, further comprising substrate support surface of within an injector disposed side having flow path provide gas second independent gas, wherein provides gases across substrate, showerhead above surface, exhaust port support, opposite injector, from chamber.
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