Properties of Polymer Resists
作者： D. M. Shinozaki , J. Wm. McGowan , P. C. Cheng , K. H. Tan
DOI: 10.1007/978-1-4613-2209-2_11
关键词:
摘要: X-ray contact microscopy consists of exposing a recording medium through the specimen interest. It is an old technique, called in earlier literature, microradiography[1]. Advances microelectronics industry and efforts to increase number elements integrated circuits have led improvements lithographic techniques recently. For using x-rays important products these advances has been availability ultra-high resolution polymer films such as poly(methylmethacrylate) record image, development suitable high intensity soft x-ray sources.
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