Structured illumination microscopy optical arrangement including projection artifact supression element

摘要: A structured illumination microscopy optical arrangement includes a projection path and an imaging path. The sensor elements. light generator, pattern generating element such as spatial modulator (SLM), elements including output lens projector artifact suppression (PASE) located in the between SLM lens. PASE may include birefringent material which splits respective rays of source to provide at least one replication with offset transverse increases accuracy system by reducing harmonic errors spurious intensity variations due pixel gap artifacts otherwise produce resulting Z-height measurements.