作者: Jean Geurts
DOI: 10.1007/BFB0107866
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摘要: The application of Raman spectroscopy is discussed for the analysis different aspects III–V semiconductor surfaces and interfaces, such as chemical reactivity, overlayer crystallinity electronic band bending. interface reactivity studied CdTe/InSb InSb/Sb. Overlayer bending are analyzed Sb layers on GaAs InP. Here submonolayer sensitivity achieved ordered chains in first monolayer (ML). Furthermore, crystalline states thicker overlayers detected. development substrate monitored by Electric Field Induced Scattering (EFIRS) from LO phonon coverages up to about 100 ML. Considerable dynamics observed thicknesses far beyond 1