Layout decomposition method applicable to a dual-pattern lithography

摘要: A layout decomposition method, applicable to a double pattern lithography, includes the steps of: putting at least stitch on each of plurality sub-patterns an initial preset intervals thereby divide into unit blocks selectively labeled as first region or second such that and in same said sub-pattern alternate, wherein any two neighboring ones attributed sub-patterns, respectively, are region, respectively; reducing stitches so generate having minimum number stitches; contiguous pattern, stitches.