作者: J.N. Butters , J.A. Leendertz
DOI: 10.1016/S0030-3992(71)80007-5
关键词:
摘要: Some of the benefits holographic interferometry in metrology are explored and related to difficulties experienced practical methods. A new type speckle pattern application is introduced which effectively samples wavefront phase, enabling interferometric measuring process be carried out with low density data recording.