Electrostatic force assisted exfoliation of prepatterned few-layer graphenes into device sites.

摘要: We present a novel fabrication method for incorporating nanometer to micrometer scale few-layer graphene (FLG) features onto substrates with electrostatic exfoliation. pattern highly oriented pyrolytic graphite using standard lithographic techniques and subsequently, in single step, exfoliate transfer-print the prepatterned FLG silicon wafer force. have successfully demonstrated exfoliation/printing of 18 nm wide nanolines periodic arrays 1.4 μm diameter pillars. Furthermore, we fabricated nanoribbon transistors patterned nanoline. Our force assisted exfoliation/print process does not need additional adhesion layers could be stepped repeated deliver graphitic material over wafer-sized areas allows construction graphene-based integrated circuits.