In Situ Modification of RF Sputter-Deposited Lithium Nickel Oxide Thin Films by Plasma Irradiation
作者： K.-F. Chiu
DOI: 10.1149/1.1803572
关键词:
摘要: Lithium nickel oxide thin films were deposited by sputter deposition. The in situ-modified using low-temperature inductively coupled plasma (ICP) irradiation. technique uses a built-in radio frequency (rf) coil to generate an ICP confined close the substrate. ions can be drawn substrate negative bias. This enables precise control of both bombarding ion flux (by rf power) and energy bias). Varying modifies film properties. crystal structure characterized as layered Li 1-y Ni 1+y O 2 or rhombohedrally distorted NiO-type z 1-z O, depending on content. modified different conditions irradiation exhibited crystallography changes texturing. composition was measured atomic emission spectroscopy X-ray photoelectron spectroscopy. diffraction. morphology observed scanning electron microscope. Half-cells made lithium fabricated discharge curves compare electrochemical properties films. treated situ anneal also prepared for comparison.
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