Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence

作者: O. Sneh , M.L. Wise , A.W. Ott , L.A. Okada , S.M. George

DOI: 10.1016/0039-6028(95)00471-8

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摘要: … Following the high pressure SiC14 reactions, the SiC] 4 was condensed in a liquid nitrogen trap. At the end of an experimental day, the trap was sealed and slowly purged with N 2. The …

参考文章(77)
The Colloid Chemistry of Silica American Chemical Society. ,(1994) , 10.1021/BA-1994-0234
Ofer Sneh, Steven M. George, Sample manipulator employing a gas-thermal switch designed for high pressure experiments in an ultrahigh vacuum apparatus Journal of Vacuum Science and Technology. ,vol. 13, pp. 493- 496 ,(1995) , 10.1116/1.579386
R. H. Stolen, Water and its relation to broken bond defects in fused silica Journal of Chemical Physics. ,vol. 64, pp. 2623- 2631 ,(1976) , 10.1063/1.432516
A. Masaki, Deep-submicron CMOS warms up to high-speed logic IEEE Circuits & Devices. ,vol. 8, pp. 18- 24 ,(1992) , 10.1109/101.167508
F. W. Smith, G. Ghidini, Reaction of Oxygen with Si(111) and (100): Critical Conditions for the Growth of SiO2 Journal of The Electrochemical Society. ,vol. 129, pp. 1300- 1306 ,(1982) , 10.1149/1.2124122
A. Ourmazd, D. W. Taylor, J. A. Rentschler, J. Bevk, Si→ SiO 2 transformation: Interfacial structure and mechanism Physical Review Letters. ,vol. 59, pp. 213- 216 ,(1987) , 10.1103/PHYSREVLETT.59.213
C. P. Tripp, M. L. Hair, Chemical attachment of chlorosilanes to silica: a two-step amine-promoted reaction The Journal of Physical Chemistry. ,vol. 97, pp. 5693- 5698 ,(1993) , 10.1021/J100123A038