Structure–property relations of arc-evaporated Al–Cr–Si–N coatings

作者: J. Soldán , J. Neidhardt , B. Sartory , R. Kaindl , R. Čerstvý

DOI: 10.1016/J.SURFCOAT.2007.12.041

关键词:

摘要: Abstract The addition of silicon to the widely used aluminum-containing transition metal nitrides is promising for synthesis hard and thermally stable films with good oxidation resistance. For that reason, Al–Cr–Si–N coatings were deposited by reactive cathodic arc-evaporation under industrial conditions from Al70Cr30 − xSix (x = 0, 1, 2, 5 at.%) targets at substrate bias voltages ranging − 40 V − 150 V. structure well adherent was investigated X-ray diffraction Raman spectroscopy, which indicated higher Al/Cr ratio > 1.9 an increased tendency metastable face-centered cubic solid solution AlN in CrN separate into a cubic–hexagonal phase mixture. At voltages, this effect gradually inverted single can be retained. photoelectron spectroscopy revealed dominant Si–N bonds suggesting either substitutional or phase. Mechanical properties, i.e. hardness elastic modulus, measured indentation together stress evolution demonstrate beneficial conservation

参考文章(31)
T. Suzuki, Y. Makino, M. Samandi, S. Miyake, Microstructure and secular instability of the (Ti1 − x,Alx)N films prepared by ion-beam-assisted-deposition Journal of Materials Science. ,vol. 35, pp. 4193- 4199 ,(2000) , 10.1023/A:1004835111782
Masahiro Kawate, Ayako Kimura, Tetsuya Suzuki, Microhardness and lattice parameter of Cr1−xAlxN films Journal of Vacuum Science and Technology. ,vol. 20, pp. 569- 571 ,(2002) , 10.1116/1.1448510
Jakob Schiøtz, Francesco D. Di Tolla, Karsten W. Jacobsen, Softening of nanocrystalline metals at very small grain sizes Nature. ,vol. 391, pp. 561- 563 ,(1998) , 10.1038/35328
M. Beckers, N. Schell, R. M. S. Martins, A. Mücklich, W. Möller, In situ x-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti–Al–N thin films Journal of Vacuum Science and Technology. ,vol. 23, pp. 1384- 1391 ,(2005) , 10.1116/1.2011400
S. Veprek, H.-D. Männling, M. Jilek, P. Holubar, Avoiding the high-temperature decomposition and softening of (Al1−xTix)N coatings by the formation of stable superhard nc-(Al1−xTix)N/a-Si3N4 nanocomposite Materials Science and Engineering A-structural Materials Properties Microstructure and Processing. ,vol. 366, pp. 202- 205 ,(2004) , 10.1016/J.MSEA.2003.08.052
J. E. Greene, Summary Abstract: Crystal growth, atomic ordering, and physical properties of epitaxial metastable semiconductors Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 5, pp. 1947- 1948 ,(1987) , 10.1116/1.574887
M. Jilek, T. Cselle, P. Holubar, M. Morstein, M. G. J. Veprek-Heijman, Stan Veprek, Development of novel coating technology by vacuum arc with rotating cathodes for industrial production of nc-(Al1-xTix)N/a-Si3N4 superhard nanocomposite coatings for dry, hard machining Plasma Chemistry and Plasma Processing. ,vol. 24, pp. 493- 510 ,(2004) , 10.1007/S11090-004-7929-3
Paul Heinz Mayrhofer, D Music, JM Schneider, None, Influence of the Al distribution on the structure, elastic properties, and phase stability of supersaturated Ti1- xAlxN Journal of Applied Physics. ,vol. 100, pp. 094906- ,(2006) , 10.1063/1.2360778
J.L. Endrino, S. Palacín, M.H. Aguirre, A. Gutiérrez, F. Schäfers, Determination of the local environment of silicon and the microstructure of quaternary CrAl(Si)N films Acta Materialia. ,vol. 55, pp. 2129- 2135 ,(2007) , 10.1016/J.ACTAMAT.2006.11.014
H. Ljungcrantz, L. Hultman, J.‐E. Sundgren, L. Karlsson, Ion induced stress generation in arc‐evaporated TiN films Journal of Applied Physics. ,vol. 78, pp. 832- 837 ,(1995) , 10.1063/1.360272