作者: Ji Won Suk , Alexander Kitt , Carl W Magnuson , Yufeng Hao , Samir Ahmed
DOI: 10.1021/NN201207C
关键词:
摘要: … The PMMA/graphene on substrate was annealed in a furnace with Ar (∼500 sccm) and H 2 (∼500 sccm) at 350 C for ∼2 h to remove the PMMA. For 300 nm deep wells, PMMA …