作者: A.J. Rouco
DOI: 10.1016/0926-860X(94)85094-1
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摘要: Abstract The reduction and oxidation of Al 2 O 3 - SiO -supported CuCl has been re-investigated using TPR. two peaks observed in the TPR profiles dried samples are attributed to a two-step CuCL as opposed previous assignments which they were types immobilized cupric species with different reducibilities. EPR measurements an sample after programmed up point between peaks, confirm absence species. carried out sequential treatments C H 4 , air HCl show that cycle -CuCl-Cu OCl -CuCl does not occur either support because reduces oxychloride CuCl. It is also shown formation Cu from requires temperatures higher than 498 K on whereas it can be formed at room temperature . addition KC1 or LaCl allows reoxidation reduced