Virtual sensor based monitoring and fault detection/classification system and method for semiconductor processing equipment

作者: Donald A. Sofge , Gabriel G. Barna , Stephanie W. Butler , David A. White

DOI:

关键词:

摘要: A virtual sensor based monitoring and fault detection/classification system (10) for semiconductor processing equipment (12) is provided. plurality of sensors (14) are each operable to measure a process condition provide signal representing the measured condition. filtering units (16) receive at least one from reduce data represented by filtered data. (24) The model states work piece in (12). Each an output estimated value modeled state. rule logic (26) signals provided monitor or detect classify faults within

参考文章(20)
Johannes L. A. Koolen, Martine R. Lapere, Steven G. Wassink, Johannes H. A. Krist, System for real time optimization ,(1994)
Ming-Shry Cher, Chung-Hsing Shan, Anisotropic polysilicon plasma etch using fluorine gases ,(1994)
Julie K. Spoerre, Gerald M. Knapp, Hsin-Hao Huang, Shui-Shun Lin, Hsu-Pin Wang, Chang-Ching Lin, Machine fault diagnostics system and method ,(1993)
John Paul Havener, Ralph Bruce Ferguson, Devendra Godbole, James David Keeler, Virtual continuous emission monitoring system with sensor validation ,(1994)
John P. Havener, Ralph B. Ferguson, Devendra Godbole, James D. Keeler, Virtual continuous emission monitoring system ,(1995)