作者: S. Thanikaikarasan , T. Mahalingam , P.J. Sebastian , C. Sanjeeviraja , Taekyu Kim
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摘要: Thin films of copper indium telluride were electrodeposited on doped tin oxide coated conducting glass (ITO) substrates at various bath temperatures and deposition potentials from an aqueous acidic containing CuSO4, In2(SO4)3 TeO2. The deposited characterized by x-ray diffraction, scanning electron microscopy, energy dispersive analysis x-rays optical absorption techniques, respectively. film structure was found to be cubic with preferential orientation along (200) plane. Using diffraction data the microstructural parameters such as crystallite size, strain, dislocation density stacking fault probability calculated. variation temperature potential studied. experimental observations are discussed in detail.