Nanosecond multi-pulse laser-induced damage mechanisms in pure and mixed oxide thin films

摘要: Abstract We report on nanosecond laser-induced damage of pure and mixed oxide thin films deposited by ion beam sputtering. Silica, hafnia alumina as well their binary mixtures have been tested in S-on-1 mode at 355 nm 266 nm using a multiscale approach. The results were analyzed qualitatively to discuss the different fatigue behaviors observed. absence multi-photon absorption step 1-on-1 thresholds function band gap indicates defect-mediated mechanisms. During multi-pulse experiments we observed defects that cause effects preexisting low-density defects, which are insensitive multiple pulse irradiation. Depending material size both types (preexisting light-induced) may contribute equally probability. Comparing behavior constituting oxides, found that, general, cannot be interpolated from oxides.