Binding energies for carbon atoms and clusters deposited on the Si(100) surface

作者: Timur Halicioglu

DOI: 10.1016/0040-6090(94)90088-4

关键词:

摘要: Abstract Binding energies of carbon atoms adsorbed on a (2×1) reconstructed Si(100) surface were calculated as function sub-monolayer coverages. Also for C deposited the small clusters, n (with = 3 and 4). All calculations conducted considering model potential developed recently systems containing Si atoms. For low coverage limit (representing coverages up to one monolayer), adatoms considered occupying only energy sites. Owing relatively large separations among these sites, C-C interactions are negligible Si-C found be contributing binding energies. The lowest in this case corresponds θ 0.25. In clusters surface, however, stronger because increasing importance interactions. From an energetic viewpoint, results obtained study indicate that adsorbing more likely form than layer-by-layer growth leading smooth uniform coverage. This outcome was consistent with various experimental results.

参考文章(9)
H. Balamane, T. Halicioglu, W. A. Tiller, Comparative study of silicon empirical interatomic potentials Physical Review B. ,vol. 46, pp. 2250- 2279 ,(1992) , 10.1103/PHYSREVB.46.2250
P. Ascarelli, S. Fontana, G. Cossu, E. Cappelli, N. Nistico, X.P.S. analysis of the Si substrate surface pretreatment for diamond film deposition Diamond and Related Materials. ,vol. 1, pp. 211- 215 ,(1992) , 10.1016/0925-9635(92)90027-L
Paul A. Dennig, Hiromu Shiomi, David A. Stevenson, Noble M. Johnson, Influence of substrate treatments on diamond thin film nucleation Thin Solid Films. ,vol. 212, pp. 63- 67 ,(1992) , 10.1016/0040-6090(92)90501-2
Timur Halicioglu, Carbon atoms on the (2 × 1) reconstructed Si(100) surface Surface Science. ,vol. 285, pp. 259- 264 ,(1993) , 10.1016/0039-6028(93)90437-O
Jeoung Woo Kim, Young-Joon Baik, Kwang Yong Eun, Annihilation of nucleation sites during diamond CVD Diamond and Related Materials. ,vol. 1, pp. 200- 204 ,(1992) , 10.1016/0925-9635(92)90025-J
J. Tersoff, Carbon defects and defect reactions in silicon Physical Review Letters. ,vol. 64, pp. 1757- 1760 ,(1990) , 10.1103/PHYSREVLETT.64.1757
Pearson E, Tiller W A, Halicioglu T, Si(111)表面の再構成に対する表面応力の効果 Surface Science. ,vol. 168, pp. 46- 51 ,(1986)