Enhanced Etching, Surface Damage Recovery, and Submicron Patterning of Hybrid Perovskites using a Chemically Gas-Assisted Focused-Ion Beam for Subwavelength Grating Photonic Applications.
作者： Mohd S. Alias , Yang Yang , Tien K. Ng , Ibrahim Dursun , Dong Shi
DOI: 10.1021/ACS.JPCLETT.5B02558
关键词:
摘要: The high optical gain and absorption of organic–inorganic hybrid perovskites have attracted attention for photonic device applications. However, owing to the sensitivity organic moieties solvents temperature, processing is challenging, particularly patterning. Here, we report direct patterning using chemically gas-assisted focused-ion beam (GAFIB) etching with XeF2 I2 precursors. We demonstrate enhancement in addition controllability marginal surface damage compared (FIB) without Utilizing GAFIB etching, fabricated a uniform periodic submicron perovskite subwavelength grating (SWG) absorber broadband nanoscale precision. Our results use FIB as tool means providing treatment (after minimize loss) nanostructures. SWG can be patterned on solar cells ...
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