A non-probe/lithography approach to nanotrench/nanochannel fabrication

摘要: We have developed a new nanochannel/nanotrench fabrication technique by combining multi-bilayer Physical Vapour Deposition (PVD) with layer-selective etching on cross-section of the layers. By using this technique, we successfully fabricated long array 35 nm-wide channels separated 10 walls without need for probe/lithography. The initially designed deposition process determines desired pattern feature sizes, while is only to reveal and trench depth. significant freedom in materials usage nanochannels, given PVD method, can provide nanostructures wide property functionality variety. simplicity, CMOS compatibility cost-effectiveness method may also be benefit.