Acid-substituted ternary acetal polymers and use thereof in photosensitive compositions and lithographic printing plates

摘要: Novel acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic groups, one is unsubstituted or substituted with an alkyl hydroxyalkyl group, another aromatic hetorocyclic moiety, and a third acid group aryl group. The advantageously employed in photosensitive compositions they utilized combination diazo resins. Such especially well adapted for use lithographic printing plates can be developed aqueous developing solutions.